Download PDF by B. O. Kolbesen (auth.), S. Coffa, F. Priolo, E. Rimini, J.: Crucial Issues in Semiconductor Materials and Processing

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By B. O. Kolbesen (auth.), S. Coffa, F. Priolo, E. Rimini, J. M. Poate (eds.)

ISBN-10: 9401052034

ISBN-13: 9789401052030

ISBN-10: 940112714X

ISBN-13: 9789401127141

Semiconductors lie on the center of a few of crucial industries and applied sciences of the 20 th century. The complexity of silicon built-in circuits is expanding significantly as a result non-stop dimensional shrinkage to enhance potency and performance. This evolution in layout ideas poses genuine demanding situations for the fabrics scientists and processing engineers. fabrics, defects and processing now must be understood of their totality. global specialists speak about, during this quantity, the the most important concerns dealing with lithography, ion implication and plasma processing, metallization and insulating layer caliber, and crystal development. specific emphasis is positioned upon silicon, yet compound semiconductors and photonic fabrics also are highlighted. the elemental recommendations of part balance, interfaces and defects play a key position in knowing those an important concerns. those options are reviewed in an important style.

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Bergholz, H. Cerva, B. Fiegl, F. Gelsdorf and G. Zoth, Nucl. Instr. Methods Phys. Res. B55, 124(1991) A. Ohsawa, K. Honda, R. Takizawa, T. Nakanishi, M. Aoki and N. Toyokura, in Semiconductor Silicon - 1990, ed. R. G. Barraclough and J. Chikawa, The Electrochem. Soc. J. (1990) p. 601 L. Jastrzebski, in Semiconductor Silicon-1990, ed. R. G. Barraclough and J. Chikawa, The Electrochem. J. (1990) p. 614 M. Tamura, S. Isomae, T. Ando, K. Ohyu, H. Yamagishi and A. Hashimoto .. in "Defects in Silicon-II", ed.

O. Kolbesen, W. Bergholz, H. Cerva, B. Fiegl, F. Gelsdorf and G. Zoth, Nucl. Instr. Methods Phys. Res. B55, 124(1991) A. Ohsawa, K. Honda, R. Takizawa, T. Nakanishi, M. Aoki and N. Toyokura, in Semiconductor Silicon - 1990, ed. R. G. Barraclough and J. Chikawa, The Electrochem. Soc. J. (1990) p. 601 L. Jastrzebski, in Semiconductor Silicon-1990, ed. R. G. Barraclough and J. Chikawa, The Electrochem. J. (1990) p. 614 M. Tamura, S. Isomae, T. Ando, K. Ohyu, H. Yamagishi and A. Hashimoto .. in "Defects in Silicon-II", ed.

Horiuchi, Jap. J. Appl. Phys. 27, 2209 (1988) S. Onishi, A. Ayukawa, K. Tanaka and K. SaITyame, J. Electrochem. Soc. ill. P. Strunk, H. G. Mohr, J. Electrochem. Soc. 135,2876 (1988) H. P. Strunk, in Proc. Int. Conf. on the Science and Technology of Defect Control in Semiconductors, K. , Elsevier Sci. Publ. Amsterdam (1990) p. G. J. B. K. R. Mader, J. Electrochem. Soc. 130,2237 (1983) H. Tachimori, T. Sakon and T. Kaneko, 7th Keitusho Kohgaku Symposium of Japan Soc. of Appl. , JSAP Catalog No: AP 902217 (June 26,1990) J.

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Crucial Issues in Semiconductor Materials and Processing Technologies by B. O. Kolbesen (auth.), S. Coffa, F. Priolo, E. Rimini, J. M. Poate (eds.)


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